How It Works:
Made in the USA, Chimere™ Bump Control After Shave Intensive Treatment is formulated with a combination of natural ingredients to smooth and calm the skin, even out the skin tone, and improve the appearance of unsightly razor bumps. This After-Shave Intensive Treatment fights razor bumps and shaving irritation with soothing the skin with natural conditioners. Natural fruit extracts effectively lighten the darkened skin of the shaved area, while gently stimulating the shedding of dead skin cells to diminish razor bumps.
- Soothe and moisturize the skin with natural humectants and anti-inflammatory actives.
- Fruit acids speed up cell renewal, regenerating a smoother complexion.
- Anti-bacterial, anti-inflammatory complexes curb inflammation and reduce irritation, preventing the contamination of newly shaved areas.
How To Use:
Use after-shaving to reduce skin dryness, and irritation, for a more even skin tone that is razor bump free. After shaving, blot dry with a towel. Dispense desired amount. Apply to clean shaven area. Massage into skin and you are ready to go. For maximum results use in combination with Chimere™ Bump Control Shave Gel Blemish Wash.
Water (aqua), Alcohol Denat, Propylene Glycol, Methyl Gluceth-20, Plysorbate 20, Hydroquinone, PVM/MA Decadiene Crossplymer, Camphor, Dioscorea Villosa (Wild Yam) Root Extract, Lactic Acid, Citric Acid, Malic Acid, Camellia Sinensis Leaf Extract, Benzophenone-4, Sodium Sulfite, Sodium Bisulfite, Sodium Hydroxide, DMDM Hydantoin, Fragrance (Parfum), Blue #1.
Propylene Glycol: Improves the skin repair function and acts as humectants to make skin feel moist and soft.
Hydroquinone: The only recommended safe and effective skin lightening agent in a cosmetic formulation.
Camphor: Antiseptic active ingredient; an organic silicone used as a skin protection and moisturizer.
Dioscorea Villosa (Wild Yarn) Root Extract: Soothing agent.
Lactic Acid: An Alpha Hydroxy acid derived from milk or sugar that can assist in shedding of dean skin cells and improves collagen formation.
Citric Acid: Natural microbial agents that inhibit the growth of bacteria on skin that causes acne and pimples.
Camellia Sinensis Leaf Extract: Reduces skin irritation and indirectly prevents breakdown of collagen and reduces skins UV damage.
Benzophenone: An organic sunscreen to protect the skin against both UVA and UVB rays & prevents darkening.